Advances in Radio Science
Advances in Radio Science
ARS
Articles
All volumes
RSS feeds
RSS feeds
Submission
Policies
Licence & copyright
General terms
Publication policy
Data policy
Publication ethics
Competing interests policy
Appeals & complaints
Proofreading guidelines
Obligations for authors
Obligations for editors
Obligations for referees
Inclusive author name-change policy
Peer review
Review process
Review criteria
Manuscript tracking
Reviewer recognition
Editorial board
About
Aims & scope
Article processing charges
Financial support
Scheduled proceedings
News & press
Promote your work
Journal statistics
Journal metrics
Abstracted & indexed
Article level metrics
Contact
Print copies
XML harvesting & OAI-PMH
Manuscript tracking
Article
Articles
Volume 9
ARS, 9, 19–26, 2011
Authors
Title
Abstract
Full text
Website search
Articles
|
Volume 9
Article
Metrics
Related articles
Articles
|
Volume 9
https://doi.org/10.5194/ars-9-19-2011
© Author(s) 2011. This work is distributed under
the Creative Commons Attribution 3.0 License.
https://doi.org/10.5194/ars-9-19-2011
© Author(s) 2011. This work is distributed under
the Creative Commons Attribution 3.0 License.
Articles
|
Volume 9
Article
Metrics
Related articles
29 Jul 2011
|
29 Jul 2011
Benefits of on-wafer calibration standards fabricated in membrane technology
M. Rohland
,
U. Arz
,
and
S. Büttgenbach
M. Rohland
×
Physikalisch-Technische Bundesanstalt, 38116 Braunschweig, Germany
Institut für Mikrotechnik, Langer Kamp 8, 38106 Braunschweig, Germany
U. Arz
×
Physikalisch-Technische Bundesanstalt, 38116 Braunschweig, Germany
S. Büttgenbach
×
Institut für Mikrotechnik, Langer Kamp 8, 38106 Braunschweig, Germany
No related articles found.
Download
Article
(312 KB)
Metadata XML
BibTeX
EndNote
Share